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Acquisition of an Atomic Layer Deposit Equipment (Ald) of Aluminum Oxide, Titanium Oxide and Hafnium Oxide

SpainTenders notice for Acquisition of an Atomic Layer Deposit Equipment (Ald) of Aluminum Oxide, Titanium Oxide and Hafnium Oxide. The reference ID of the tender is 120184626 and it is closing on 16 Jun 2025.

Tender Details

  • Country: Spain
  • Summary: Acquisition of an Atomic Layer Deposit Equipment (Ald) of Aluminum Oxide, Titanium Oxide and Hafnium Oxide
  • EST Ref No: 120184626
  • Deadline: 16 Jun 2025
  • Financier: Self Financed
  • Purchaser Ownership: Government
  • Tender Value: EUR 450000
  • Notice Type: Tender
  • Document Ref. No.: 353456-2025
  • Purchaser's Detail:
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  • Description:
  • The current ability to perform deposits of dielectric materials at the NTC Institute at micro/nanometric scale and wafer level is limited to chemical techniques in vapor phase (CVD). Improved steam deposit equipment is available with plasma which offer thin filmsAmorphous dielectric. The ALD process consists of the growth of a thin film by consecutive atomic layers. The fact of having an ALD team that in addition to increasing the manufacturing capacity, will offer uniformity and compliance of the film on any scale and would have a clearImpact on the quality of the research carried out as on the capabilities offered by the NTC Institute would be very high. ALD is the most advanced technique in thin film coating due to the precise control of the film thickness (NM) it offers. The films produced byThis technique is dense, without pores and without defects, and the conditions in which the process is carried out, 1-10 HPA 200-400C, are soft enough to be used with sensitive substrates. This type of process is also fundamental when working with external clients and supplyingQuality controls and technical specifications of manufactured devices. As the semiconductor industry continues to evolve, the increasingly fine size of the devices makes it especially important to find or develop more advanced techniques ofcre...
  • Documents:

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Acquisition of an Atomic Layer Deposit Equipment (Ald) of Aluminum Oxide, Titanium Oxide and Hafnium Oxide - Spain Tender

The RECTORADO OF THE POLYTECHNIC UNIVERSITY OF VALENCIA, a Government sector organization in Spain, has announced a new tender for Acquisition of an Atomic Layer Deposit Equipment (Ald) of Aluminum Oxide, Titanium Oxide and Hafnium Oxide. This tender is published on SpainTenders under EST Ref No: 120184626 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2025-06-16.

The estimated tender value is EUR 450000, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.

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